کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
10269423 459855 2005 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Growth of etch pits formed during sonoelectrochemical etching of aluminum
موضوعات مرتبط
مهندسی و علوم پایه مهندسی شیمی مهندسی شیمی (عمومی)
پیش نمایش صفحه اول مقاله
Growth of etch pits formed during sonoelectrochemical etching of aluminum
چکیده انگلیسی
Anodes of aluminum electrolytic capacitor, which requires large surface area for a high capacitance, are prepared with electrochemical etching. Ultrasound contributes to the increase of etch pit density by prohibiting anodic oxide film formation and induces uniform tunnel length distribution by enhancing the transport of corrosion product, AlCl3, present inside etch tunnels. Compared to low 28 kHz, smaller and higher density of cavitation bubbles at 68 kHz frequency induces higher pit and tunnel density and increases the survival rate of tunnels to 55.8% in the process of tunnel growth from 3 to 12 μm. It results in the increase of capacitance by 110% at anodization voltage of 100 V.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Electrochimica Acta - Volume 51, Issue 5, 10 November 2005, Pages 1012-1016
نویسندگان
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