کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
10364409 | 871623 | 2011 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Preliminary characterization of a metal-gas-semiconductor field-effect transistor (MGSFET) proposed
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی کامپیوتر
سخت افزارها و معماری
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چکیده انگلیسی
Regarding the device performance, it is observed that drain current drivability of MGSFET is about four times worse than that of conventional MOSFET. It is speculated that the inferiority is caused by the permittivity difference between SiO2 and air. While, the gate leakage current of MOSFET obviously becomes worse after the catastrophic breakdown, but that of MGSFET becomes much better than before in forced breakdown of gate insulation. In this first trial of MGSFET implementation, the forced breakdown simultaneously degrades normal transistor performance. Further investigation should be made to analyze what is going on MGSFET structure.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 88, Issue 3, March 2011, Pages 213-217
Journal: Microelectronic Engineering - Volume 88, Issue 3, March 2011, Pages 213-217
نویسندگان
Yoichi Ashida, Kiyoshi Okuyama, Hideo Sunami,