کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
10407117 892868 2016 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Sputtered WO3 films for water splitting applications
موضوعات مرتبط
مهندسی و علوم پایه سایر رشته های مهندسی مهندسی برق و الکترونیک
پیش نمایش صفحه اول مقاله
Sputtered WO3 films for water splitting applications
چکیده انگلیسی
Tungsten oxide films with different thickness were grown by sputtering deposition. Analysis of sample morphology showed that the films were constituted by sub-micrometric columnar structures, with diameters in the range 100-500 nm. As-deposited films revealed an almost-amorphous crystal structure and a wide optical band-gap of about 3.28 eV. Thermal annealing at 500 °C was used to promote the formation of a monoclinic WO3 crystal structure and the reduction of the band-gap. Photo-electrochemical characterizations were used to compare the responses of the different films and to evaluate their possible use in water splitting applications.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Science in Semiconductor Processing - Volume 42, Part 1, February 2016, Pages 150-154
نویسندگان
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