Nano-patterned visible wavelength filter integrated with an image sensor exploiting a 90-nm CMOS process

► We propose a highly efficient visible wavelength filter enabling a homogeneous integration with an image sensor, which can be fabricated by employing an advanced standard 90-nm CMOS process. ► We design and implement the proposed device incorporating a metallic subwavelength grating embedded in a CMOS image sensor. ► We analyze the characteristics of the visible wavelength filter by referring to the practical metal-grating structures.