کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1403015 | 984803 | 2008 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Pattern transfer fidelity in capillary force lithography with poly(ferrocenylsilane) plasma etch resists
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی آلی
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Pattern transfer fidelity in capillary force lithography with poly(ferrocenylsilane) plasma etch resists Pattern transfer fidelity in capillary force lithography with poly(ferrocenylsilane) plasma etch resists](/preview/png/1403015.png)
چکیده انگلیسی
The influence of processing conditions and polymer architecture on pattern transfer in capillary force lithography (CFL) using poly(ferrocenylsilane) etch resists is investigated. Zero-shear-rate viscosities measured at different temperatures and for polymers with different molar masses are related to the quality of CFL patterns, assessed based on atomic force microscopy experiments. An optimal range of viscosities corresponding to appropriate molar masses and processing temperatures is established. In this range, polymers possess enough mobility allowing for reasonably quick surface pattern formation. Yet, the polymers are not too mobile and preserve their shape when quenched to below Tg prior to serving as etch resist masks.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: European Polymer Journal - Volume 44, Issue 8, August 2008, Pages 2523–2528
Journal: European Polymer Journal - Volume 44, Issue 8, August 2008, Pages 2523–2528
نویسندگان
Igor Korczagin, Hong Xu, Mark A. Hempenius, G. Julius Vancso,