A matrix isolation study of the reactions of OVCl3 with a series of silanes

The reactions between OVCl3 and a series of silanes have been investigated using matrix isolation infrared spectroscopy. Twin-jet co-deposition of the two reagents into argon matrices at 14 K followed by irradiation with light of λ>300 nm led to the growth of a number of new bands. These have been assigned to the appropriate silanol species formed by oxygen insertion into the Si-H bond, complexed to VCl3. The structures and vibrational frequencies of these complexes have been characterized by high-level theoretical calculations. These calculations also support the relative preference for the insertion reaction compared to other possible pathways.