کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1445163 | 1509572 | 2016 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Topologically close-packed phases: Deposition and formation mechanism of metastable β-W in thin films
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سرامیک و کامپوزیت
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
β-W is a metastable, topologically close-packed phase with the A15 structure. The deposition of β-W, using N2 as the impurity gas introduced into the sputtering chamber, is reported and a mechanism for β-W formation is proposed. Molecules of the impurity gas in the chamber are adsorbed onto the surface during the deposition process and act as nucleation sites for the formation of β-W. The proposed mechanism is supported by the dependence of β-W phase fraction in sputter deposited films on pressure of N2 and on substrate temperature.
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ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Acta Materialia - Volume 104, 1 February 2016, Pages 223–227
Journal: Acta Materialia - Volume 104, 1 February 2016, Pages 223–227
نویسندگان
Jiaxing Liu, Katayun Barmak,