کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1446184 988601 2013 7 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Stability and migration of charged oxygen interstitials in ThO2 and CeO2
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد سرامیک و کامپوزیت
پیش نمایش صفحه اول مقاله
Stability and migration of charged oxygen interstitials in ThO2 and CeO2
چکیده انگلیسی

Density functional theory calculations have been carried out to study the stability and migration of charged oxygen interstitials in ThO2 and CeO2. The calculations demonstrate that the oxygen interstitial is likely to lose electrons under p-type conditions and gain electrons under n  -type conditions. Neutral Osplit0 and singly positive Osplit+ O–O〈1 1 0〉 split interstitials, and doubly negative octahedral (Oocta.2-) oxygen interstitial are found to be the lowest-energy configurations within a certain Fermi energy range. In both oxides, the Osplit0 is the most mobile, and the migration energies of the split oxygen interstitials in ThO2 are lower than in CeO2, indicating higher oxygen interstitial mobility in ThO2 than in CeO2.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Acta Materialia - Volume 61, Issue 20, December 2013, Pages 7639–7645
نویسندگان
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