کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1448390 988672 2010 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Microtwinning in highly nonstoichiometric VOx thin films
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد سرامیک و کامپوزیت
پیش نمایش صفحه اول مقاله
Microtwinning in highly nonstoichiometric VOx thin films
چکیده انگلیسی

Both pulsed-DC biased and commercial ion-beam sputtered VOx thin films maintain a face-centered-cubic nanocrystalline phase, even for stoichiometries of x > 1.5, which is well outside the bulk equilibrium solubility range for cubic VOx. Many of these highly nonstoichiometric films exhibit a high density of microtwins, which give rise to unusual fine structure in the selected-area electron diffraction patterns, namely: an additional defect ring; a significant broadening of the {2 0 0} ring; pairs of parallel rod features which are tangent to the additional defect ring; and additional fine-structure features between the {2 0 0} and {2 2 0} rings. The formation of the microtwins is correlated with the coalescence of vanadium vacancies along the {1 1 1} twin planes in the crystalline lattice.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Acta Materialia - Volume 58, Issue 15, September 2010, Pages 5009–5014
نویسندگان
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