کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1448869 | 988685 | 2008 | 10 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Stacking faults in quaternary InxAlyGa1âxâyN layers
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سرامیک و کامپوزیت
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چکیده انگلیسی
Quaternary In0.12Al0.29Ga0.59N and In0.10Al0.02Ga0.88N layers â¼200Â nm thick were grown on (0Â 0Â 0Â 1) GaN/sapphire composites using metalorganic chemical vapor deposition. The layers were studied using transmission electron microscopy (TEM). TEM results indicate that the quaternary layers contain high-density stacking faults (SFs). Weak-beam dark-field analysis coupled with high-resolution electron microscopy reveal that SFs have zinc-blende structures bounded by Shockley partials. Compared with In0.10Ga0.90N layers, SF density increases substantially in the In0.10Al0.02Ga0.88N layer with only 2% additional Al. Z-contrast annular dark-field images showed that SFs are Al-rich in the In0.12Al0.29Ga0.59N layer, but not in the In0.10Al0.02Ga0.88N layer. Two reference AlxGa1âxN layers were grown using identical conditions except the carrier gases. Using H2 carrier gas resulted in a â¼400Â nm thick Al0.45Ga0.55N layer with no SFs, while using N2 carrier gas resulted in a â¼250Â nm thick Al0.25Ga0.75N layer with SFs. It is suggested that the low surface mobility of (CH3)2Al:NH2 species in the N2 environment led to SF formation in the quaternary layers.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Acta Materialia - Volume 56, Issue 15, September 2008, Pages 4036-4045
Journal: Acta Materialia - Volume 56, Issue 15, September 2008, Pages 4036-4045
نویسندگان
F.Y. Meng, M. Rao, N. Newman, R. Carpenter, S. Mahajan,