Stability of carbon nanowalls against chemical attack with acid solutions

In this paper we report on the stability of CNW layers, synthesized by a radiofrequency plasma jet, against the chemical attack with different acid solutions (sulfuric acid, nitric acid, hydrochloric acid, and hydrofluoric acid). We present the changes of the morphology and structure of the CNW caused by the post-growth chemical treatments. We demonstrate that self-sustaining and transferable CNW layers can be obtained, by chemically dissolving the substrates, while the initial characteristics of the material are well preserved.

► The architecture of layers of CNW layers is preserved upon acid treatments.
► Substrate removal by acids leads to self-sustaining and transferable CNWs layers.
► Acid treatments of CNWs remove the metallic traces, thus purifying the material.
► Stability of CNWs to acids attack is useful for electrochemical applications.