کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1554987 | 998821 | 2009 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Bilayer period dependence of CrN/CrAlN nanoscale multilayer thin films
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
مواد الکترونیکی، نوری و مغناطیسی
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
CrN/CrAlN nanoscale multilayer thin films with a bilayer period (λ) ranging from 4.4 to 44.1 nm were deposited on Si wafers (100) by closed field unbalanced magnetron sputtering (CFUBMS). The λ of the layers was controlled by the rotation speed of the substrate holder. The coatings were characterized by high resolution X-ray diffraction and field emission transmission electron microscopy. The CrN/CrAlN nanoscale multilayer thin films exhibited a CrN (200) and AlN (200) crystalline orientation. Nano-indentation testing revealed a hardness ranging from 37 to 46 GPa according to the bilayer period. The highest hardness was obtained with a bilayer period of 5.5 nm due to the high resistance to plastic deformation.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Superlattices and Microstructures - Volume 45, Issue 2, February 2009, Pages 73-79
Journal: Superlattices and Microstructures - Volume 45, Issue 2, February 2009, Pages 73-79
نویسندگان
Youn J. Kim, Tae J. Byun, Jeon G. Han,