کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1555054 | 1513252 | 2008 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Patterning of permalloy thin films by means of electron-beam lithography and focused ion-beam milling
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
مواد الکترونیکی، نوری و مغناطیسی
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چکیده انگلیسی
Focused ion-beam milling has been employed to structure magnetic nanoelements from 20Â nm thick films of permalloy (Ni81Fe19). Rectangles are patterned into permalloy thin films grown on Si substrates by means of electron-beam lithography and focused ion-beam (FIB) milling down to 100Â nm dimensions. In this study, we analyse the effect of the FIB milling parameters (ion current, spot size, dose) on the resulting magnetic domain structures. The ion currents have been varied between 10Â pA and 10Â 000Â pA; the dose of the ion beam used for milling was varied in order to achieve the best definition for the milled areas. The resulting edges of the permalloy structures are characterized by means of AFM. We find that a small ion dose does not affect the resulting magnetic domain patterns in the structures, so FIB milling can be applied to create high-quality permalloy nanostructures.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Superlattices and Microstructures - Volume 44, Issues 4â5, OctoberâNovember 2008, Pages 699-704
Journal: Superlattices and Microstructures - Volume 44, Issues 4â5, OctoberâNovember 2008, Pages 699-704
نویسندگان
S. Getlawi, M.R. Koblischka, U. Hartmann, C. Richter, T. Sulzbach,