کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1555054 1513252 2008 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Patterning of permalloy thin films by means of electron-beam lithography and focused ion-beam milling
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد مواد الکترونیکی، نوری و مغناطیسی
پیش نمایش صفحه اول مقاله
Patterning of permalloy thin films by means of electron-beam lithography and focused ion-beam milling
چکیده انگلیسی
Focused ion-beam milling has been employed to structure magnetic nanoelements from 20 nm thick films of permalloy (Ni81Fe19). Rectangles are patterned into permalloy thin films grown on Si substrates by means of electron-beam lithography and focused ion-beam (FIB) milling down to 100 nm dimensions. In this study, we analyse the effect of the FIB milling parameters (ion current, spot size, dose) on the resulting magnetic domain structures. The ion currents have been varied between 10 pA and 10 000 pA; the dose of the ion beam used for milling was varied in order to achieve the best definition for the milled areas. The resulting edges of the permalloy structures are characterized by means of AFM. We find that a small ion dose does not affect the resulting magnetic domain patterns in the structures, so FIB milling can be applied to create high-quality permalloy nanostructures.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Superlattices and Microstructures - Volume 44, Issues 4–5, October–November 2008, Pages 699-704
نویسندگان
, , , , ,