کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1555239 | 1513257 | 2006 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
UV-Raman scattering study of lattice recovery by thermal annealing of Eu+ -implanted GaN layers
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
مواد الکترونیکی، نوری و مغناطیسی
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
Lattice recovery of Eu-implanted GaN has been studied by means of Raman scattering under UV excitation. GaN epilayers implanted at 300Â keV with doses ranging from 2Ã1014 to 4Ã1015Â cmâ2 and subsequently annealed at 1000Â âC for 20Â min show an increasing degree of disorder as the implantation dose increases. Higher temperature annealings up to 1300Â âC were also investigated in samples having an AlN capping layer. Disorder related modes, observed in samples annealed at 1000Â âC, disappear at higher annealing temperatures, indicating an incomplete lattice recovery at 1000Â âC. The Raman scattering spectra show resonant A1(LO) multiphonon scattering up to sixth order, whose relative intensities depend on the implantation dose. The intensity ratios between multiphonon peaks observed for the highest implantation doses suggest a spread of the resonance, which could be related to a heterogeneous strain distribution, also indicative of incomplete lattice recovery.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Superlattices and Microstructures - Volume 40, Issues 4â6, OctoberâDecember 2006, Pages 440-444
Journal: Superlattices and Microstructures - Volume 40, Issues 4â6, OctoberâDecember 2006, Pages 440-444
نویسندگان
D. Pastor, S. Hernández, R. Cuscó, L. Artús, R.W. Martin, K.P. O'Donnell, O. Briot, K. Lorenz, E. Alves,