کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1621972 | 1516399 | 2009 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
An in-situ TEM investigation on microstructure evolution of Ni-25Â at.% Al thin films
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فلزات و آلیاژها
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چکیده انگلیسی
The microstructure evolution of Ni-25 at.% Al thin films prepared by magnetron co-sputtering is investigated by using in-situ transmission electron microscopy (TEM) study from room temperature to 750 °C. The diffraction rings of both Ni and Al are present in the selected area electron diffraction (SAED) of as-deposited films, and then the diffraction ring of Al disappears when the films are heated up to 300 °C. At 500 and 700 °C, the diffraction rings and spots of L12 intermetallic Ni3Al phase are found, respectively, which means that the formation of ordered Ni3Al phase starts from 500 °C. Moreover, it is found that the grain growth is relatively slow when the temperature is lower than 300 °C, while all of normal grain growth, abnormal grain growth and annealing twinning occur at higher temperatures.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Alloys and Compounds - Volume 478, Issues 1â2, 10 June 2009, Pages 240-245
Journal: Journal of Alloys and Compounds - Volume 478, Issues 1â2, 10 June 2009, Pages 240-245
نویسندگان
P.Y. Li, H.M. Lu, S.C. Tang, X.K. Meng,