کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1623396 | 1516415 | 2008 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Studies on electrochromic properties of nickel oxide thin films prepared by reactive sputtering
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فلزات و آلیاژها
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
The non-stoichiometric nickel oxide (NiOx, x > 1) films deposited on a conducting substrate by RF magnetron sputtering have been investigated for electrochromism in alkaline solution. It was found that both Ni3+ and Ni2+ existed in NiOx films. The intercalation and deintercalation of H+ ions causes the bleaching and coloring of NiOx films. The atomic ratio of Ni and O in the NiOx films is 0.7:1 (as-deposited); 0.51:1 (bleached); 0.45:1 (colored). The maximal optical density change was found to be 0.78 at a spectral of 326 nm. With the increase of temperature of heat treatment, the electrochromic properties of NiOx films were weakened.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Alloys and Compounds - Volume 462, Issues 1â2, 25 August 2008, Pages 356-361
Journal: Journal of Alloys and Compounds - Volume 462, Issues 1â2, 25 August 2008, Pages 356-361
نویسندگان
Huaran Liu, Wenming Zheng, Xin Yan, Boxue Feng,