کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1625677 1516434 2007 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Influence of LaNiO3 bottom electrode on the structural and physical properties of ferroelectric capacitors
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فلزات و آلیاژها
پیش نمایش صفحه اول مقاله
Influence of LaNiO3 bottom electrode on the structural and physical properties of ferroelectric capacitors
چکیده انگلیسی

Techniques such as high energy electron diffraction (RHEED), atomic force microscope (AFM) are used to characterize LNO film prepared by rf sputtering. It is found that LNO films are epitaxially grown on the SrTiO3 (STO) substrates. Root mean square roughness (RMS) of LNO film increases with increasing growth temperature, and then becomes somewhat saturated when deposition temperature is higher than 350 °C. Meanwhile, resistivity of LNO film decreases with increasing growth temperature, and becomes relatively stable when deposition temperature is higher than 200 °C. It is found that ferroelectric properties of LaNiO3/Pb(Zr,Ti)O3/LaNiO3 (LNO/PZT/LNO) capacitors prepared on STO substrate strongly depend on the deposition temperature of LNO bottom electrode. The higher the deposition temperature of LNO bottom electrode, the larger is the switchable polarization of LNO/PZT/LNO capacitor.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Alloys and Compounds - Volume 440, Issues 1–2, 16 August 2007, Pages 276–280
نویسندگان
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