کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1658020 1517655 2013 7 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Growth and characteristics of diamond-like carbon films with titanium and titanium nitride functional layers by cathode arc plasma
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Growth and characteristics of diamond-like carbon films with titanium and titanium nitride functional layers by cathode arc plasma
چکیده انگلیسی

Diamond-like carbon (DLC) bilayer films were prepared on silicon substrate by direct-current and pulse cathode arc method, using nano-scaled Ti and TiN interlayer and surface layer as functional layer. All films were annealed at 500 °C in vacuum. The structural, morphological and mechanical properties of DLC bilayers were investigated in dependence of functional layer and annealing by Raman spectroscopy, Auger electron spectroscopy, scanning electron microscopy and atomic force microscopy, Knoop sclerometer and surface profilometer. The results showed that adding interlayer or surface layer on carbon layer could change the microstructure of the bilayer, including the atom diffusion at interface, the ordering and size of sp2 carbon clusters, and atomic rearrangement of carbon bonds. The interlayer introduced in the bilayer determined the growth mode of carbon layer, while the surface layer was characterized by the injection effect of Ti and N atoms/ions to the carbon layer. Moreover TiN surface layer facilitated the formation of graphitic microcrystal in the carbon layer. Some significant differences of Ti and TiN functional layers in the bilayer depended on themselves structure feature and reaction ability with carbon. The hardness and internal stress of the bilayer were affected accordingly. All bilayers after annealing showed an improved hardness especially for the case of Ti and TiN surface layers.


► DLC bilayer with Ti (TiN) interlayer and surface layer was fabricated by cathode arc method.
► Complete diffusion occurs at the interface of C/Ti but not for C/TiN.
► Ti surface layer activates atomic rearrangement of Csp3 due to an energy release of TiC bonds.
► TiN surface layer facilitates the formation of graphite microcrystal.
► DLC bilayers with Ti (TiN) functional layer annealing show an improved hardness.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 223, 25 May 2013, Pages 17–23
نویسندگان
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