کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1684758 1518760 2007 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Iso-concentration study of atomistic mechanism of B diffusion in Si
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد سطوح، پوشش‌ها و فیلم‌ها
پیش نمایش صفحه اول مقاله
Iso-concentration study of atomistic mechanism of B diffusion in Si
چکیده انگلیسی

B diffuses in crystalline Si by reacting with Si self-interstitial (I) with a frequency g, forming a BI complex that can migrate for an average length λ. We experimentally measured both g and λ as a function of the hole concentration p by means of iso-concentration experiments on B delta-layers both under p- and n-doping conditions. On the basis of these data, we propose a comprehensive model that fixes the interplay among free charge, I and BI charge states that determines the B diffusion. Pairing effect with donors was also considered.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 257, Issues 1–2, April 2007, Pages 165–168
نویسندگان
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