کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1790368 1524428 2014 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Quantitative monitoring of InAs quantum dot growth using X-ray diffraction
موضوعات مرتبط
مهندسی و علوم پایه فیزیک و نجوم فیزیک ماده چگال
پیش نمایش صفحه اول مقاله
Quantitative monitoring of InAs quantum dot growth using X-ray diffraction
چکیده انگلیسی


• We used X-ray diffraction to perform in situ monitoring of MBE-grown QDs.
• The QD lateral and vertical sizes were determined as a function of growth time.
• The total volume of QDs was found to increase at a similar rate over the range of 450–480 °C.
• Significant mass transport is observed from the wetting layer and substrate.

Synchrotron X-ray diffraction has been applied to the in situ monitoring of the molecular beam epitaxial growth of self-assembled InAs/GaAs(001) quantum dots (QDs). As well as the strain distribution inside QDs, the lateral and vertical size of QDs was determined as a function of growth time. In combination with post-growth atomic force microscopy, the evolution of the total volume of QDs was evaluated. It was found that the QD volume increases at a similar rate over the temperature range of 450–480 °C. A significant mass transport from the wetting layer and the substrate was confirmed.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Crystal Growth - Volume 401, 1 September 2014, Pages 372–375
نویسندگان
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