کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1792642 | 1023653 | 2011 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Plasma-assisted electroepitaxy as a method for the growth of GaN layers
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
فیزیک و نجوم
فیزیک ماده چگال
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Plasma-assisted electroepitaxy as a method for the growth of GaN layers Plasma-assisted electroepitaxy as a method for the growth of GaN layers](/preview/png/1792642.png)
چکیده انگلیسی
In the current study we have demonstrated the feasibility of a novel approach for the growth of the GaN layers namely plasma-assisted electroepitaxy (PAEE). In this method, we have tried to combine advantages of the plasma process for producing high concentrations of active N species in the Ga melt with the advantages of electroepitaxy in transferring the N species from the Ga surface to the growth interface without spontaneous crystallization on the surface or within the solution. We have designed and built a new growth chamber which allows us to combine the Molecular Beam Epitaxy process with a Liquid Phase Electroepitaxy system. We have demonstrated that it is possible to grow GaN layers by PAEE at growth temperatures as low as â¼500 °C and with low nitrogen overpressures of â¼3Ã10â5 Torr. We have shown that the combination of the two processes, an N-plasma flux and a DC current, are vital for the successful growth of GaN layers by PAEE. The exact mechanisms, which lead to the growth of GaN by PAEE, still need to be investigated.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Crystal Growth - Volume 316, Issue 1, 1 February 2011, Pages 51-55
Journal: Journal of Crystal Growth - Volume 316, Issue 1, 1 February 2011, Pages 51-55
نویسندگان
S.V. Novikov, C.R. Staddon, A.J. Kent, C.T. Foxon,