کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1793738 | 1023681 | 2009 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Formation of micrometer-order-thick poly-Si films on textured glass substrates by flash lamp annealing of a-Si films prepared by catalytic chemical vapor deposition
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
فیزیک و نجوم
فیزیک ماده چگال
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
We investigate the microstructures of polycrystalline silicon (poly-Si) films formed by flash lamp annealing (FLA) of 4.5-μm-thick precursor a-Si films prepared by catalytic chemical vapor deposition (Cat-CVD) on Cr-coated textured glass substrates. Crystallization of a-Si is performed, keeping the dome-shaped structure formed during deposition of a-Si. The poly-Si film consists of densely-packed fine grains with sizes on the order of 10 nm. The grain size tends to increase approaching the Si/Cr interface, which can be understood as the result of solid-phase nucleation and following crystallization. Minority carrier lifetimes of the poly-Si films are worse than those formed on flat substrates. This degradation might be due to gaps in the Si layer formed during a-Si deposition or FLA.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Crystal Growth - Volume 311, Issue 3, 15 January 2009, Pages 769-772
Journal: Journal of Crystal Growth - Volume 311, Issue 3, 15 January 2009, Pages 769-772
نویسندگان
K. Ohdaira, T. Fujiwara, Y. Endo, K. Nishioka, H. Matsumura,