کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
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1793868 | 1023685 | 2008 | 4 صفحه PDF | دانلود رایگان |
![عکس صفحه اول مقاله: Growth of InAs on Si substrates at low temperatures using metalorganic vapor phase epitaxy Growth of InAs on Si substrates at low temperatures using metalorganic vapor phase epitaxy](/preview/png/1793868.png)
The growth behavior of InAs on Si using metalorganic vapor phase epitaxy (MOVPE) was studied. The large lattice mismatch of InAs to Si, ∼12%, results in island formation under typical MOVPE growth conditions, which prevents the development of the thin coherent films of InAs needed for high-speed device applications. The growth of InAs at low temperature is expected to lead to rapid nucleation and low surface mobility, resulting in the formation of a coherent film at low thicknesses. This study explored the growth behavior of InAs on Si at low temperatures, i.e. <350 °C and varying V/III ratio. InAs films were grown on {1 0 0}-, {1 1 1}- and {2 1 1}-oriented Si substrates using trimethyl indium, tertiary butyl arsine and AsH3. Small islands ranging from 15 to 30 nm form on the samples at growth temperatures <325 °C. Subsequent annealing of this thin layer at 600 °C for 5 min leads to island coarsening. High-resolution X-ray diffraction, atomic force microscopy and scanning electron microscopy were used to characterize InAs layer grown on Si.
Journal: Journal of Crystal Growth - Volume 310, Issue 23, 15 November 2008, Pages 4772–4775