کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1794466 | 1023699 | 2009 | 5 صفحه PDF | دانلود رایگان |
![عکس صفحه اول مقاله: Growth of InAs/InP-based quantum dots for 1.55 μm laser applications Growth of InAs/InP-based quantum dots for 1.55 μm laser applications](/preview/png/1794466.png)
Photoluminescence and scanning electron microscopy have been used to study the growth of InAs quantum dots with InGaAsP barriers on (0 0 1) InP substrates for 1.55 μm laser applications. The effect of growing quantum dots on a thin GaP layer as well as the use of a two step dot capping procedure was investigated, optimising for dot density, emission energy, and photoluminescence emission full-width half-maximum. It was found that the emission energy of a dot layer could be tuned around the important 1.55 μm wavelength range while maintaining a high dot density and narrow dot size distribution, even when stacking multiple layers. An optimised dot structure was then used as the core of a single lateral mode laser diode demonstrating continuous wave operation at room temperature with a threshold of 25.9 mA and slope efficiency of 0.3 A/W.
Journal: Journal of Crystal Growth - Volume 311, Issue 6, 1 March 2009, Pages 1482–1486