Fabrication and properties of GaN-based lasers

In this paper we will discuss the application of almost dislocation-free, high-pressure grown gallium nitride bulk crystals as a substrate for the epitaxy of GaN/InGaN/AlGaN laser diode structures. We show that these laser diodes may have very low dislocation densities (even down to 8×104 cm−2). These dislocations appear during the growth of the laser structure as a result of the combined effect of strain and perturbation of the atomic step flow. We show also that the lifetime of these devices seems to be dependent on operating current via the increasing junction temperature.