کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1797424 1023789 2006 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
SIMS-depth profile and microstructure studies of Ti-diffused Mg-doped near-stoichiometric lithium niobate waveguide
موضوعات مرتبط
مهندسی و علوم پایه فیزیک و نجوم فیزیک ماده چگال
پیش نمایش صفحه اول مقاله
SIMS-depth profile and microstructure studies of Ti-diffused Mg-doped near-stoichiometric lithium niobate waveguide
چکیده انگلیسی
Ti-diffused planer waveguides have been fabricated on pure and Mg-doped near stoichiometric lithium niobate (SLN). Secondary ion mass spectroscopy method was applied to study the Ti diffusion in 1 mol% Mg-doped Z-cut SLN crystal. 100 nm Ti film has been deposited on LN substrate by e-beam evaporation at room temperature. Diffusion constant value for Mg-doped SLN is lower (1.84×10−13 cm−2/s) than that of pure SLN. Mg-doped CLN also possesses low diffusion constant value of 1.27×10−13 cm−2/s due to higher doping concentration of Mg (5 mol%). AFM topographic observation reveals that Mg-doped SLN shows lower surface roughness than Mg-doped CLN. The roughness (peak to valley) of the Ti-diffused Mg:SLN is 20 nm compared to 62 nm for the congruent LN waveguide. These features make Mg:SLN highly attractive for the fabrication of efficient waveguides.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Crystal Growth - Volume 287, Issue 2, 25 January 2006, Pages 472-477
نویسندگان
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