کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1797451 | 1023789 | 2006 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Correlation of the structural and ferromagnetic properties of Ga1âxMnxN grown by metalorganic chemical vapor deposition
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
فیزیک و نجوم
فیزیک ماده چگال
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
Metalorganic chemical vapor deposition (MOCVD) has been used to grow high-quality epitaxial films of Ga1âxMnxN of varying thickness and manganese doping levels. No macroscopic second phases were observed via high resolution X-ray diffraction. Atomic force microscopy revealed MOCVD-like step flow growth patterns with a mean surface roughness as low as 3.78Â Ã
in lightly doped samples, and matched that of the underlying GaN template layers. No change in the growth mechanism and morphology with Mn incorporation is observed. A uniform Mn concentration in the epitaxial layers is confirmed by secondary ion mass spectrometry. SQUID measurements showed an apparent RT ferromagnetic hysteresis with saturation magnetizations as high as 2.4μB/Mn at x=0.008, which decreases with increasing Mn incorporation or reduced structural quality. Co-doping with either Si or Mg during the resulting growth process resulted in a large decrease in the saturation magnetization values. Competition for incorporation between Mn and Mg during the MOCVD growth process is observed.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Crystal Growth - Volume 287, Issue 2, 25 January 2006, Pages 591-595
Journal: Journal of Crystal Growth - Volume 287, Issue 2, 25 January 2006, Pages 591-595
نویسندگان
Matthew H. Kane, Martin Strassburg, William E. Fenwick, Ali Asghar, Adam M. Payne, Shalini Gupta, Qing Song, Z. John Zhang, Nikolaus Dietz, Christopher J. Summers, Ian T. Ferguson,