کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1813084 | 1525250 | 2008 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Surface growth and anomalous scaling of sputter-deposited Al films
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
فیزیک و نجوم
فیزیک ماده چگال
پیش نمایش صفحه اول مقاله
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چکیده انگلیسی
Thin Al films are sputter deposited on Si(1 0 0) substrates and the surface growth is studied by atomic force microscopy. The scaling analysis reveals intrinsic anomalous scaling and multi-scaling in surface growth of the films. The anomalous scaling is characterized by the local roughness exponent and the local growth exponent, αloc=1.0±0.1 and βloc=0.35±0.02, respectively, the global ones, α=1.6 and β=0.56±0.03, and the coarsening exponent 1/z=0.36. The rms local slope scales with time as Ïât0.19±0.02. The anomalous scaling is related to the nonlocal shadowing effect during film growth. Together with the unstable growth and the global roughening, surface smoothing is also observed, which is ascribed to surface diffusion of the adatoms during film growth.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Physica B: Condensed Matter - Volume 403, Issues 13â16, 1 July 2008, Pages 2306-2311
Journal: Physica B: Condensed Matter - Volume 403, Issues 13â16, 1 July 2008, Pages 2306-2311
نویسندگان
T. Fu, Y.G. Shen,