Fabrication of La0.85Na0.15Mn1−xNixO3 (x=0, 0.05, 0.1) thin films on Si substrates via chemical solution deposition

Polycrystalline La0.85Na0.15Mn1−xNixO3 (x=0, 0.05, 0.1) thin films were successfully fabricated on Si (1 0 0) substrates using chemical solution deposition method. The results revealed that with the increase of the Ni content, the X-ray diffraction intensity ratio of I(1 1 1)/I(2 0 0) increased, whereas both the grain size and the roughness decreased. The magnetic and transport measurements showed that it was effective to tune the magnetoresistance (MR) effects via Ni doping at Mn sites.