کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
192560 459745 2009 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Ruthenium electrodeposition on silicon from a room-temperature ionic liquid
موضوعات مرتبط
مهندسی و علوم پایه مهندسی شیمی مهندسی شیمی (عمومی)
پیش نمایش صفحه اول مقاله
Ruthenium electrodeposition on silicon from a room-temperature ionic liquid
چکیده انگلیسی

Electrochemical deposition of ruthenium on n-type silicon from an ionic liquid is reported for the first time. The study was performed by dissolving ruthenium(III) chloride in a 1-butyl-3-methyl imidazolium hexafluorophosphate (BMIPF6) room-temperature ionic liquid (RTIL). Cyclic voltammetry (CV) studies demonstrate reduction and stripping peaks at −2.1 and 0.2 V vs. Pt quasi-reference, corresponding to the deposition and dissolution of ruthenium, respectively. Metallic Ru films of ∼100 nm thickness have been deposited and were analyzed using scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS).

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Electrochimica Acta - Volume 54, Issue 25, 30 October 2009, Pages 6042–6045
نویسندگان
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