کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
194678 | 459797 | 2006 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Cathodic behavior of co-sputtered Cu/V oxides thin films
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی شیمی
مهندسی شیمی (عمومی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Cathodic behavior of co-sputtered Cu/V oxides thin films Cathodic behavior of co-sputtered Cu/V oxides thin films](/preview/png/194678.png)
چکیده انگلیسی
In this paper, Cu/V oxide thin films were prepared by reactive d.c./r.f. co-sputtering. Nanostructured films were obtained and their composition and crystallinity were investigated. The electrochemical behavior of the thin film electrodes was studied, in order to evaluate their performance as cathodes in miniaturized systems. The behavior of the mixed oxide films and the pure vanadium pentoxide in thin film form are compared. All films presented a high insertion capacity in the first cycle. The film with composition Cu4.0VO5.5 presented the highest capacity and stability in comparison with all the other films.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Electrochimica Acta - Volume 51, Issue 26, 15 August 2006, Pages 5885–5891
Journal: Electrochimica Acta - Volume 51, Issue 26, 15 August 2006, Pages 5885–5891
نویسندگان
E.A. Souza, R. Landers, M.H. Tabacniks, L.P. Cardoso, A. Gorenstein,