کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
196684 | 459849 | 2005 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Controllable nanogap fabrication on microchip by chronopotentiometry
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی شیمی
مهندسی شیمی (عمومی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Controllable nanogap fabrication on microchip by chronopotentiometry Controllable nanogap fabrication on microchip by chronopotentiometry](/preview/png/196684.png)
چکیده انگلیسی
This work aims to solve one of the key issues for developing molecular and nanoscale devices, i.e., how to controllably fabricate nano/angstrom-size gaps on microchips. It has been shown that with a galvanostat and use of the electrode potential as the feedback, we can be used to electrochemically fabricate metallic electrode pair with controlled gap widths ranging from about ten nanometers down to few angstroms. It is based on probing the potential drop in the electrical double layer across the two electrodes during the narrowing of the gap. The process is simple and controllable, allowing rapid fabrication of nanogaps and adaptation of a commonly used electrochemical instrument.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Electrochimica Acta - Volume 50, Issue 15, 20 May 2005, Pages 3041–3047
Journal: Electrochimica Acta - Volume 50, Issue 15, 20 May 2005, Pages 3041–3047
نویسندگان
Bo Liu, Juan Xiang, Jing-Hua Tian, Can Zhong, Bing-Wei Mao, Fang-Zu Yang, Zhao-Bin Chen, Sun-Tao Wu, Zhong-Qun Tian,