کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
4484859 1316934 2009 8 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Effect of bromide on the formation of disinfection by-products during wastewater chlorination
موضوعات مرتبط
مهندسی و علوم پایه علوم زمین و سیارات فرآیندهای سطح زمین
پیش نمایش صفحه اول مقاله
Effect of bromide on the formation of disinfection by-products during wastewater chlorination
چکیده انگلیسی

The effect of bromide ion on the formation and speciation of trihalomethanes (THMs) and haloacetic acids (HAAs) during the chlorination of biologically treated wastewaters was investigated. The experimental results showed that the formation of total THMs and total HAAs during chlorine disinfection increased with increasing bromide levels in wastewater. The formation of CHBr3 increased nearly linearly with increasing bromide ion levels, while CHCl2Br and CHClBr2 increased with increasing bromide concentration from 0 to 3.2 mg L−1 and thereafter remained constant or slightly decreased. Increasing initial bromide levels up to 12.8 mg L−1 resulted in sharp decrease of the concentration of CHCl3 and chloro- HAAs. The mixed bromochloro- HAAs and bromo-only species replaced chloro- HAAs as the dominated species of HAA with increasing bromide levels. The distribution of monohalogenated, dihalogenated and trihalogenated species of HAAs in chlorinated wastewater at high concentration of bromide (>2 mg L−1) is different from that of drinking/natural water. The values of the bromine incorporation factors, n (Br) and n′ (Br), increased with increasing bromide concentration and remained constant or slightly decreased with increasing contact time under the studied range of bromide ion concentrations during chlorination. Moreover, the bromine incorporation into THMs was higher than that of HAAs with bromide levels ranging from 1.0 to 12.8 mg L−1, indicating the dissimilar formation mechanisms of THMs and HAAs involving bromide.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Water Research - Volume 43, Issue 9, May 2009, Pages 2391–2398
نویسندگان
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