Investigation of the barrier slurry with better defect performance and facilitating post-CMP cleaning

Investigation of the barrier slurry with better defect performance and facilitating post-CMP cleaning

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 170, 25 February 2017, Pages 21-28

Xiaodong Luan, Yuling Liu, Baoguo Zhang, Shengli Wang, Xinhuan Niu, Chenwei Wang, Juan Wang,