کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
4971047 | 1450314 | 2017 | 11 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
SiOCH thin films deposited by chemical vapor deposition: From low-κ to chemical and biochemical sensors
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی کامپیوتر
سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: SiOCH thin films deposited by chemical vapor deposition: From low-κ to chemical and biochemical sensors SiOCH thin films deposited by chemical vapor deposition: From low-κ to chemical and biochemical sensors](/preview/png/4971047.png)
چکیده انگلیسی
Significant advances have been made in the realization of porous SiOCH by chemical vapor deposition processes. In this paper, the different approaches developed to introduce porosity in an organosilicate thin films are described with a specific focus on the new concepts to obtain highly porous SiOCH by CVD and to simplify the existing processes. A second part of the paper is dedicated to the application of these porous SiOCH thin films in nanotechnologies: from low-κ dielectrics to chemical and biochemical sensors.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 167, 5 January 2017, Pages 69-79
Journal: Microelectronic Engineering - Volume 167, 5 January 2017, Pages 69-79
نویسندگان
V. Jousseaume, J. El Sabahy, C. Yeromonahos, G. Castellan, A. Bouamrani, F. Ricoul,