کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5006043 | 1461379 | 2017 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Electron interference effects and strong localization in Cu doped ZnO thin films
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
سایر رشته های مهندسی
مهندسی برق و الکترونیک
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Electron interference effects and strong localization in Cu doped ZnO thin films Electron interference effects and strong localization in Cu doped ZnO thin films](/preview/png/5006043.png)
چکیده انگلیسی
Electron interference effects and transition from weakly localized to a strongly localized transport regime is observed in Cu doped ZnO thin films grown by pulsed laser deposition on c-sapphire substrates. The doping concentration of Cu was varied from 0% to 10%. Up to the doping concentration of ~ 0.5%, the films showed weakly localized behavior where quantum corrections to conductivity due to electron interference was active. At these doping concentrations, a transition from 3D to 2D weak localization was also observed as the measurement temperature was decreased. But at Cu concentrations of 5% and beyond, the films were found to show behavior of strong localization where the transport at low temperature was dominated by hopping mechanism.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Science in Semiconductor Processing - Volume 68, September 2017, Pages 275-278
Journal: Materials Science in Semiconductor Processing - Volume 68, September 2017, Pages 275-278
نویسندگان
Amit K. Das, P. Misra, R.S. Ajimsha, V.K. Sahu, B. Singh,