کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5365713 | 1388336 | 2010 | 5 صفحه PDF | دانلود رایگان |
![عکس صفحه اول مقاله: Structural and optical properties of a-Si1âxCx:H films synthesized by dc magnetron sputtering technique Structural and optical properties of a-Si1âxCx:H films synthesized by dc magnetron sputtering technique](/preview/png/5365713.png)
Hydrogenated amorphous SiC films (a-Si1âxCx:H) were prepared by dc magnetron sputtering technique on p-type Si(1Â 0Â 0) and corning 9075 substrates at low temperature, by using 32 sprigs of silicon carbide (6H-SiC). The deposited a-Si1âxCx:H film was realized under a mixture of argon and hydrogen gases. The a-Si1âxCx:H films have been investigated by scanning electronic microscopy equipped with an EDS system (SEM-EDS), X-ray diffraction (XRD), secondary ions mass spectrometry (SIMS), Fourier transform infrared spectroscopy (FTIR), UV-vis-IR spectrophotometry, and photoluminescence (PL). XRD results showed that the deposited film was amorphous with a structure as a-Si0.80C0.20:H corresponding to 20Â at.% carbon. The photoluminescence response of the samples was observed in the visible range at room temperature with two peaks centred at 463Â nm (2.68Â eV) and 542Â nm (2.29Â eV). In addition, the dependence of photoluminescence behaviour on film thickness for a certain carbon composition in hydrogenated amorphous SiC films (a-Si1âxCx:H) has been investigated.
Journal: Applied Surface Science - Volume 256, Issue 14, 1 May 2010, Pages 4591-4595