Poly-Si heaters for ultra-fast local temperature control of on-wafer test structures

• On-wafer poly-Si heater structures for ultra-fast (heating speed ∼20,000 °C/s) local temperature control are demonstrated.
• The temperature is measured locally by using diodes as thermometers.
• Local temperature changes up to +350 °C are demonstrated; up to 500 °C in combination with a temperature controlled chuck.
• Design guidelines are proposed to maximize the power-to-temperature efficiency and the robustness of the heater structure.
• The spatial temperature profile in the surrounding of the heater is shown to be well described by the 3D heat equation.

In this technical note we demonstrate poly-Si heaters for electrically-controlled ultra-fast local temperature change of on-wafer test structures. By comparing two different heaters, design guidelines are proposed for optimizing the power-to-temperature conversion and the reliability of the structure. Local temperature changes up to +350 °C are demonstrated, with a remarkable heating speed of ∼20,000 °C/s. The spatial temperature profile around the heating structure is also studied.

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