کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
539267 1450374 2013 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Barrier heights engineering of Al/p-Si Schottky contact by a thin organic interlayer
موضوعات مرتبط
مهندسی و علوم پایه مهندسی کامپیوتر سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
Barrier heights engineering of Al/p-Si Schottky contact by a thin organic interlayer
چکیده انگلیسی

The current–voltage (I–V) characteristics of the Al/Alq3/p-Si Schottky diode shows rectified behavior with a potential barrier formed at the contact interface. The barrier height and the ideality factor values are 0.78  eV and 1.53, respectively. The barrier height of the Al/Alq3/p-Si diode is larger than that (∼0.58 eV) of the conventional Al/p-Si diode. It reveals that the organic film, Alq3, controls the carrier transport of the diode at the contact interface. A linear relationship of 1/C2vs. V plot under the reverse bias is shown and the effective barrier height is 0.69 eV by capacitance–voltage (C–V) measurement. The electrical characteristics of the diode are also discussed by using Norde’s function and Cheung’s method.

Figure optionsDownload as PowerPoint slideHighlights
► A new organic interlayered Schottky barrier diode Al/Alq3/Si was realized.
► It shows higher barrier height than conventional metal/Si Schottky diode.
► The series resistance of the diode was discussed.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 107, July 2013, Pages 200–204
نویسندگان
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