Computer generated hologram-ROM fabrication and duplication by EBL and UV-NIL

• We have demonstrated the duplication of CGH-ROM by means of UV-NIL.
• It is using a 3D master mould fabricated by EBL with no etching process.
• The minimum size and step width of the CGH-ROM was 300 × 300 μm and 300 nm.
• We examined the relationships between the RLT and the reconstruction images.

High speed and large capacity read only memory (ROM) is strongly required for the increasing data size of pictures, videos and other files. Computer generated hologram-ROM (CGH-ROM) has the potential possibility to meet these demands and is receiving a lot of attention as the next generation ROM. However, CGH-ROM is difficult to produce in large volume at low cost because it requires a nano-scale precision structure as well as nano-steps. Therefore, in order to fabricate the complex and high-precision pattern cost-effectively, the authors employed ultraviolet nanoimprint lithography (UV-NIL). The three-dimensional (3D) CGH-ROM master mould was fabricated by electron beam lithography (EBL). In this study, the thickness of the residual layer under the CGH pattern was examined. The result showed the target reconstruction image of the CGH-ROM was obtained regardless of a residual layer thickness. Furthermore, the authors have succeeded in fabrication of a CGH-ROM with a 300 nm step width and demonstrated its reconstruction.

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