کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5396561 | 1505756 | 2010 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Formation of self-organized Ta nano-structures by argon ion sputtering of Ta foil: XPS and AFM study
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
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چکیده انگلیسی
The nano-structured Ta has been prepared by 3Â keV argon ion sputtering of the Ta foil. The XPS and AFM studies were carried out on samples sputtered for fluences ranging from 6.0Ã1015 to 3.6Ã1016Â ions/cm2. The sample sputtered at lowest fluence showed the formation of dimples along with mild ripples which disappeared on further sputtering. After prolonged sputtering, clear ripple formation has been observed with a wave length of about 80Â nm. Our XPS results indicated that Ta 4f of the Ta liberated after sputtering is shifted to higher binding energy by 0.5Â eV. The Ta2O5 completely disappeared after prolonged sputtering for 60Â min, but little amount of sub-Ta oxide (TaOx) is still seen.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Electron Spectroscopy and Related Phenomena - Volume 180, Issues 1â3, June 2010, Pages 1-5
Journal: Journal of Electron Spectroscopy and Related Phenomena - Volume 180, Issues 1â3, June 2010, Pages 1-5
نویسندگان
V.R.R. Medicherla, S. Majumder, D. Paramanik, Shikha Varma,