کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
5396561 1505756 2010 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Formation of self-organized Ta nano-structures by argon ion sputtering of Ta foil: XPS and AFM study
موضوعات مرتبط
مهندسی و علوم پایه شیمی شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
Formation of self-organized Ta nano-structures by argon ion sputtering of Ta foil: XPS and AFM study
چکیده انگلیسی
The nano-structured Ta has been prepared by 3 keV argon ion sputtering of the Ta foil. The XPS and AFM studies were carried out on samples sputtered for fluences ranging from 6.0×1015 to 3.6×1016 ions/cm2. The sample sputtered at lowest fluence showed the formation of dimples along with mild ripples which disappeared on further sputtering. After prolonged sputtering, clear ripple formation has been observed with a wave length of about 80 nm. Our XPS results indicated that Ta 4f of the Ta liberated after sputtering is shifted to higher binding energy by 0.5 eV. The Ta2O5 completely disappeared after prolonged sputtering for 60 min, but little amount of sub-Ta oxide (TaOx) is still seen.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Electron Spectroscopy and Related Phenomena - Volume 180, Issues 1–3, June 2010, Pages 1-5
نویسندگان
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