کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5397319 | 1392330 | 2006 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
The electronic structure of carbon films deposited in rf argon-hydrogen plasma
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: The electronic structure of carbon films deposited in rf argon-hydrogen plasma The electronic structure of carbon films deposited in rf argon-hydrogen plasma](/preview/png/5397319.png)
چکیده انگلیسی
The electronic structure of C films deposited by sputtering a graphite target in rf. Ar-H2 plasma is investigated by photoemission, Auger emission and electron energy loss spectroscopy (EELS) as a function of the H2 concentration in the feed gas, referred to as [H2]. Adding hydrogen to the plasma causes the films to change from a graphite-like unhydrogenated structure to a non-graphitic hydrogenated structure. The film mass density, as derived from the ÏÂ +Â Ï plasmon energy, decreases upon H2 addition to the gas mixture, goes through a minimum at low [H2] and increases with increasing [H2]. It reveals a non-monotonous behavior of the film H content as a function of [H2], the maximum H incorporation occurring at low [H2]. This appears to be a characteristic of C deposition via graphite sputtering in Ar-H2 plasma and it is discussed in connection with previous results on the subject.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Electron Spectroscopy and Related Phenomena - Volume 150, Issue 1, January 2006, Pages 40-46
Journal: Journal of Electron Spectroscopy and Related Phenomena - Volume 150, Issue 1, January 2006, Pages 40-46
نویسندگان
L. Calliari, M. Filippi, N. Laidani, M. Anderle,