Flow property measurements for nanoimprint simulation

Number of recent works report that viscoelastic properties of ultra-thin polymer film (below 100 nm) could drastically change from bulk values, deeply impacting nanoimprint process simulation. A good knowledge of thin resist film viscosity is thus needed, either for UV imprint, or thermal imprint. Nanoimprint lithography has been used to characterize sub 100 nm resist film flow properties above glass transition temperature. Specifically designed stamps have been manufactured to control silicon etched lines motion into the melt polymer. Adapted fluid modelling is proposed to calculate dynamic viscosity of thin polymer film for different temperatures from experimental data. Good agreements between ours results and literature were found.