کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
540112 | 1450398 | 2007 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
The role of MEMS in maskless lithography
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی کامپیوتر
سخت افزارها و معماری
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چکیده انگلیسی
The challenges for maskless lithography at several wafers per hour at the 45–32 nm lithography node are analyzed. The conclusion is that such speed is only obtainable with systems based on massive parallelism, whether the principle is based on light optics, electron optics or atomic force microscopes. The construction of such systems demands the use of micro-electro-mechanical systems (MEMS). Different concepts employing MEMS are reviewed. Typical requirements for the manufacturing of the MEMS components are analyzed for a multi-column electron beam concept such as the MAPPER system. Examples of successfully fabricated array structures are shown.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 84, Issues 5–8, May–August 2007, Pages 1027–1032
Journal: Microelectronic Engineering - Volume 84, Issues 5–8, May–August 2007, Pages 1027–1032
نویسندگان
P. Kruit,