Combined electron beam and UV lithography in SU-8

We present combined electron beam and UV lithography (CEUL) in SU-8 as a fast and flexible lithographic technique for prototyping of functional polymer devices and pattern transfer applications. CEUL is a lithographic technique suitable for defining both micrometer and nanometer scale features in a single polymer film on the wafer scale. The height of the micrometer and nanometer scale features is matched within 30 nm. As a pattern transfer application, we demonstrate stamp fabrication and thermal nanoimprint of a 2-dimensional array of 100 nm wide lines with a pitch of 380 nm in connection with micrometer scale features.