Three dimensional HSQ structures formed using multiple low energy electron beam lithography

A method is presented for the fabrication of three-dimensional (3D) structures formed in hydrogen silsequioxane (HSQ) by a process of multiple low energy electron beam exposures with a single development step. Structures have been produced consisting of multiple layers of dielectric rods with widths and heights of 150 nm and a separation of 1μm in the horizontal plane and 360 nm in the vertical direction.