کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
540931 | 1450400 | 2006 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Fabrication of multi-layered nano-channels by reversal imprint lithography
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی کامپیوتر
سخت افزارها و معماری
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چکیده انگلیسی
Fabrication of multi-layered 3-dimensional nano-channels is demonstrated by a reversal imprint lithography using a single kind of polymer. A patterned polymer on a mold is heated up over the glass transition temperature and is pressed to a lower layer on a substrate. To avoid depression of the lower layer, the substrate is kept below the glass transition temperature by cooling the stage which holds the substrate. The thermal condition for upper and lower stages, which hold the mold and substrate, is investigated by solving thermal equation. By controlling the stage temperatures, tri-layered nano-channels having 160 nm feature size is successfully demonstrated using PMMA.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 83, Issues 4–9, April–September 2006, Pages 876–879
Journal: Microelectronic Engineering - Volume 83, Issues 4–9, April–September 2006, Pages 876–879
نویسندگان
Masaki Nakajima, Takashi Yoshikawa, Kenji Sogo, Yoshihiko Hirai,