Comparison of multilayer stamp concepts in UV–NIL

Template fabrication is one of the crucial issues in nanoimprint lithography. In this paper three different multilayer stamp concepts are compared that allow the imprinting of high resolution pattern on wafer scale with one imprint step only. Fabrication recipes as well as an analysis of local and global deformation, resolution and area homogeneity in an UV–NIL process are given. Advantages and disadvantages of the concepts are discussed.