کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
541535 | 1450395 | 2009 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Numerical study on bubble trapping in UV-nanoimprint lithography
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی کامپیوتر
سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Numerical study on bubble trapping in UV-nanoimprint lithography Numerical study on bubble trapping in UV-nanoimprint lithography](/preview/png/541535.png)
چکیده انگلیسی
Bubble trapping in the template pattern during the resist filling process is one of the most serious issues in UV-nanoimprint lithography. The mechanism of bubble trapping is studied based on a numerical analysis of the resist flow in a simple model. Flow behavior of water-like low viscosity liquid as a resist is investigated for particular structures of the template and the contact angles for the template and the substrate. Time evolutions of the flow of the resist are simulated and the mechanism of bubble trapping is demonstrated. The results show that large contact angle between the resist and the template causes bubble trapping, however the contact angle between the resist and the substrate does not greatly influence the results.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 86, Issues 4–6, April–June 2009, Pages 684–687
Journal: Microelectronic Engineering - Volume 86, Issues 4–6, April–June 2009, Pages 684–687
نویسندگان
Daisuke Morihara, Hiroshi Hiroshima, Yoshihiko Hirai,