Keywords: مقاومت کردن; Cholic acid (PubChem CID: 221493); Deoxycholic acid (PubChem CID: 222528); Chenodeoxycholic acid (PubChem CID: 10133); Taurocholic acid (PubChem CID: 6675); Lipase (PubChem CID: 54603431); Ethanol (PubChem CID: 702); Citric acid (PubChem CID: 311); Resist
مقالات ISI مقاومت کردن (ترجمه نشده)
مقالات زیر هنوز به فارسی ترجمه نشده اند.
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در صورتی که به ترجمه آماده هر یک از مقالات زیر نیاز داشته باشید، می توانید سفارش دهید تا مترجمان با تجربه این مجموعه در اسرع وقت آن را برای شما ترجمه نمایند.
Keywords: مقاومت کردن; Aerobic fitness; Anaerobic threshold; Exercise tolerance; Adolescents; RESIST
Keywords: مقاومت کردن; Talbot effect; Lithography; Simulation; Resist; Defect; Mask
Selective etching of PDMS: Etching technique for application as a positive tone resist
Keywords: مقاومت کردن; PDMS; Resist; Development; Etching; Irradiation; Proton Beam Writing (PBW);
Selective etching of PDMS: Etching as a negative tone resist
Keywords: مقاومت کردن; PDMS; Resist; Development; Etching; Irradiation; Proton Beam Writing (PBW);
Dynamics of radical cations of poly(4-hydroxystyrene) in the presence and absence of triphenylsulfonium triflate as determined by pulse radiolysis of its highly concentrated solution
Keywords: مقاومت کردن; Poly(4-hydroxystyrene); Deprotonation; Pulse radiolysis; Radiation chemistry; Resist;
High-aspect-ratio patterning by ClF3-Ar neutral cluster etching
Keywords: مقاومت کردن; Resist; Reactive ion etching (RIE); ClF3-Ar; Neutral cluster etching; High aspect ratio;
Study of the decomposition mechanism of PMMA-type polymers by hydrogen radicals
Keywords: مقاومت کردن; Polymer decomposition; Resist; Hot-wire; Hydrogen radical; PMMA-type polymers
Synthesis and property of noria (water-wheel like macrocycle) derivatives with pendant alkoxyl and adamantyl ester groups, and their application for extreme ultraviolet resist
Keywords: مقاومت کردن; Synthesis; Cyclic oligomer; Resist; Noria; Extreme ultraviolet; Dynamic covalent chemistry; Photo-acid generator
High molecular weight polystyrene as very sensitive electron beam resist
Keywords: مقاومت کردن; Nanofabrication; Nanolithography; Electron beam lithography; Resist; Polystyrene;
Preparation, characterization and technological evaluation of CMC derived from rice-straw as thickening agents in discharge, discharge-resist and burn-out printing
Keywords: مقاومت کردن; Carboxymethylcellulose; Discharge; Resist; Burn out; Printing;
Development of interference lithography for 22 nm node and below
Keywords: مقاومت کردن; Extreme ultraviolet; Interference; Transmission grating; Undulator; Resist
Impact of molecular structure of polymer in 193 nm resist performance
Keywords: مقاومت کردن; Molecular weight; Polymer structure; 193 nm Lithography; Photo acid generator; Resist
Consequences of non-standard bleaching on microlithographic performance
Keywords: مقاومت کردن; Optical bleaching; Resist; Process latitude; Photolithography
Numerical study on bubble trapping in UV-nanoimprint lithography
Keywords: مقاومت کردن; UV-nanoimprint; Resist; Polymer; Contact angle; Bubble; Template; Viscos flow
Surface characterization of plasma-modified resist patterns by ToF-SIMS analysis
Keywords: مقاومت کردن; Plasma; Inkjet; ToF-SIMS; Resist; Bank; Pixel;
High resolution electron beam lithography of PMGI using solvent developers
Keywords: مقاومت کردن; PMGI; Electron beam lithography; Solvant developer; Resist; High resolution
New resists for proton beam writing
Keywords: مقاومت کردن; 07.78.+s; 85.40.Hp; 81.16.Nd; 81.15.PqProton beam writing; Direct write; High aspect ratio; Resist
Elimination of organic contaminants from silicon wafers using high concentration ozonated-water
Keywords: مقاومت کردن; Silicon; Ozone; Water; Self-decomposition; Resist
Micro-machining of resists on silicon by proton beam writing
Keywords: مقاومت کردن; 85.40.Hp; 85.40.Xx; 34.50.Bw; 34.50.−s; 81.15.PqProton beam writing; Micro-machining; Resist; PMMA; SU-8; Nanoimprint; Electroplating
CD control of direct versus complementary exposure for shaped beam writers and its correlation to the local registration error
Keywords: مقاومت کردن; e-Beam direct write; Direct exposure; Complementary exposure; Resist; Registration error; CD; Variable shaped beam
Fabricating nanoscale device features using the 2-step NERIME nanolithography process
Keywords: مقاومت کردن; Ion beam lithography; Resist; Semiconductor device fabrication; Etch; Topography
Development of a novel, low-viscosity UV-curable polymer system for UV-nanoimprint lithography
Keywords: مقاومت کردن; UV-nanoimprint lithography; Resist; UV curing; Spin-coating
Systematic considerations for the patterning of photonic crystal devices by electron beam lithography
Keywords: مقاومت کردن; 42.82.Cr; 81.16.Nd; 85.40.HpPhotonic crystal; E-beam lithography; Resist; Stitching error; Proximity effect correction
Laser controlled nanodeposition of neutral atoms
Keywords: مقاومت کردن; Atom nanofabrication; Laser manipulation; Resist; Self-assembling monolayers;
Comparative study of calixarene and HSQ resist systems for the fabrication of sub-20Â nm MOSFET device demonstrators
Keywords: مقاومت کردن; Electron beam lithography; Resist; Calixarene; HSQ;
Novel electron beam resist material using hydrophilic protecting group
Keywords: مقاومت کردن; EB lithography; Resist; Acetal; Alicyclic; Adamantane; Lactone; Solubility parameter;
Silicon-containing copolymers of MMA tested for a positive-tone high-resolution bi-layer e-beam resist system
Keywords: مقاومت کردن; Electron beam lithography; Resist; Bi-layer system; Silicon-loaded PMMA;
High performance resist for EUV lithography
Keywords: مقاومت کردن; EUV; Lithography; Resist; Adamantyl methacrylate; Hydroxystyrene;